|
A mask set or a photomask set is a series of electronic data that define geometry for the photolithography steps of semiconductor fabrication. Each of the physical masks generated from this data is called a photomask. A mask set for a modern process typically contains as many as twenty or more masks, each of which defines a specific photolithographic step in the semiconductor fabrication process. Examples of masks include: * p-well * n-well * active * poly * p-select * n-select * contact * metal1, 2, 3... For more information, see photolithography and semiconductor manufacturing. == References == * Saint, Christopher and Judy. (2002). ''IC Layout Basics''. McGraw-Hill. ISBN 0-07-138625-4 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「Mask set」の詳細全文を読む スポンサード リンク
|